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- W2016455304 abstract "The electrical properties of transparent, conductive layers prepared from nanoparticle dispersions of doped oxides are highly sensitive to impurities. Production of cost-effective thin conducting films for consumer electronics often employs wet processing such as spin and/or dip coating of surfactant-stabilized nanoparticle dispersions. This inherently results in entrainment of organic and inorganic impurities into the conducting layer leading to largely varying electrical conductivity. Therefore, this study provides a systematic investigation on the effect of insulating surfactants, small organic molecules and silica in terms of pressure dependent electrical resistivity as a result of different core/shell structures (layer thickness). Application of high temperature flame synthesis gives access to antimony-doped tin oxide (ATO) nanoparticles with high purity. This well-defined starting material was then subjected to representative film preparation processes using organic additives. In addition ATO nanoparticles were prepared with a homogeneous inorganic silica layer (silica layer thickness from 0.7 to 2 nm). Testing both organic and inorganic shell materials for the electronic transport through the nanoparticle composite allowed a systematic study on the influence of surface adsorbates (e.g., organic, insulating materials on the conducting nanoparticle's surface) in comparison to well-known insulators such as silica. Insulating impurities or shells revealed a dominant influence of a tunneling effect on the overall layer resistance. Mechanical relaxation phenomena were found for 2 nm insulating shells for both large polymer surfactants and (inorganic) SiO(2) shells." @default.
- W2016455304 created "2016-06-24" @default.
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- W2016455304 date "2012-05-08" @default.
- W2016455304 modified "2023-10-01" @default.
- W2016455304 title "Electrical Resistivity of Assembled Transparent Inorganic Oxide Nanoparticle Thin Layers: Influence of Silica, Insulating Impurities, and Surfactant Layer Thickness" @default.
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- W2016455304 doi "https://doi.org/10.1021/am300319r" @default.
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