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• W2016642719 abstract "Self-diffusion in nickel single crystals is measured between 813 and 1193 K using ion-beam sputtering as a microsectioning technique. Gaussian activity-depth profiles are observed over about three orders of magnitude in the activity decrease. The bulk diffusivities obtained from these profiles are analysed in conjunction with Bakker's high temperature data. The monovacancy contribution to the lattice diffusivity is given by D = 0.92 exp (−2.88 eV/kT) cm2/s. Preliminary isotope effect experiments are also performed at two temperatures in the high-temperature region. The results support the view that a divacancy contribution to self-diffusion exists near the melting point. Die Selbstdiffusion in Nickeleinkristallen wird zwischen 813 und 1193 K unter Verwendung der Ionenstrahlzerstäubung als Abtrageverfahren für sehr dünne Schichten gemessen. Gauß-Profile werden über etwa drei Größenordnungen des Aktivitätsabfalls beobachtet. Die Volumendiffusionskoeffizienten, die man aus diesen Profilen erhält, werden in Verbindung mit Bakkers Hochtemperaturdaten analysiert. Der Beitrag der Einfachleerstellen zur Volumendiffusion ist durch D = 0,92 exp (−2,88 eV/kT) cm2/s gegeben. Isotopieeffektexperimente von vorläufigem Charakter werden bei zwei Temperaturen im Hochtemperaturbereich durchgeführt. Die Resultate bestätigen die Ansicht, daß bei Temperaturen in der Nähe des Schmelzpunktes Doppelleerstellen zur Selbstdiffusion beitragen." @default.
• W2016642719 created "2016-06-24" @default.
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• W2016642719 date "1976-12-01" @default.
• W2016642719 modified "2023-10-02" @default.
• W2016642719 title "Self-diffusion in nickel at low temperatures" @default.
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• W2016642719 doi "https://doi.org/10.1002/pssb.2220780230" @default.
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