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- W2016644810 abstract "Abstract An expanded study of the diffusion of ion-implanted 85Kr in KCl has been undertaken with improved analytical and experimental techniques. These include an analysis of diffusion profiles, separation of the effects of radiation damage from those of the normal lattice (by chemically stripping the damaged region), and use of specimens which are doped with CaCl2. Diffusion coefficients are examined in the context of diffusion theory where D is assumed, in the case of unstripped samples, to have the following spatial variation: D = D1 (1 + cx)4/3 for 0 ≤ x ≤ a, and D = D1 (1 + ca)4/3 for x ⩾ a. The results revealed two diffusion components, the one occurring from 175 to ⩾250°C and the other occurring from ⩾250 to at least 500°C. The high-temperature component is shown to involve interstitial migration in the presence of cation-vacancy traps. Thus (a) the depth profiles were indicative of normal diffusion kinetics, (b) the process was better defined in stripped (i.e. damage-free) specimens, (c) there was an inverse correlation with CaCl2 doping provided the specimens were stripped, and (d) the ΔH of 2·1eV agreed fairly well with Norgett's theoretical value of about 1·7 eV. The low-temperature component was less readily explained, though for reasons which are essentially the converse to those given above may be assumed to involve Kr interaction either with unspecifiable damage centers or with other gas atoms." @default.
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- W2016644810 title "Diffusion of ion-implanted 85Kr in KCl, including the effects of channeling, radiation damage, and divalent doping" @default.
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- W2016644810 doi "https://doi.org/10.1016/s0022-3697(72)80470-0" @default.
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