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• W2016688891 abstract "This paper describes the preliminary results of an investigation of TiN films produced by pulsed nitrogen ion implantation (20–30 keV) concurrent with titanium vapour deposition, and followed by bombardment with 100 to 800 ion pulses of progressively decreasing energy. For these studies, composition analysis of the TiN films indicates the presence of the TiNx (x = 0.6–1.0) phase, and composition-depth profiles of the TiN films show a thick mixing layer of about 600 Å at the film-substrate interface. The mechanical properties of the film were investigated using the scratch test for adhesion, as well as by friction and wear analysis. The implanted films remained adherent throughout the tests and exhibited both low friction and low wear." @default.
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• W2016688891 date "1990-02-01" @default.
• W2016688891 modified "2023-10-16" @default.
• W2016688891 title "TiN films produced by pulsed ion beam and vapour deposition" @default.
• W2016688891 cites W1996897114 @default.
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• W2016688891 doi "https://doi.org/10.1016/0168-583x(90)90007-h" @default.
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