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- W2016738768 abstract "In this presented work, both top and bottom pinning FeNi/FeMn bialyers were prepared by sputtering with an external field applied in the film plane during deposition. The training processes were performed with a vector vibrating sample magnetometer (VVSM) through which M <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> and M <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>y</sub> can be measured simultaneously. Before the tuning process, ten loops were measured at an angle of six degrees with respect to the initial PD, to eliminate the training effect to a very low extent. Then an in-plane tuning field of 600 Oe was applied perpendicular to the initial PD for five minutes. During the whole process, the rotation of the PD is identified with M <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>y</sub> = 0 and M <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>x</sub> = Maximum immediately after each M-H loop measurement and each tuning process [3]." @default.
- W2016738768 created "2016-06-24" @default.
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- W2016738768 date "2010-10-01" @default.
- W2016738768 modified "2023-09-25" @default.
- W2016738768 title "Tuning the exchange bias training effect in top and bottom pinning FeNi/FeMn bilayers" @default.
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- W2016738768 doi "https://doi.org/10.1109/ivesc.2010.5644172" @default.
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