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• W2016790731 abstract "Co ions of energy 100 KeV and fluences between 1.25/spl times/10/sup 16/ and 5.0/spl times/10/sup 16/ Co/sup +//cm/sup 2/ were implanted in single crystal TiO/sub 2/(110) substrates at temperatures of 300, 875 and 1075 K. Co depth profiles were obtained using X-ray photoelectron spectroscopy and Rutherford backscattering spectrometry. The Co diffused to a much greater depth when implanted at 1075 K compared to implantation at lower temperatures. The valence state of Co was investigated using Co K and L edge X-ray absorption near edge spectra. Although implantation at lower temperatures results in a mixture of metallic and oxidized Co, implantation at 1075 K results in no measurable Co(0) in the sample. The magnetic properties were investigated using magneto-optical Kerr-effect and vibrating sample magnetometer. The sample implanted at 1075 K shows ferromagnetic properties at room temperature." @default.
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• W2016790731 date "2004-01-24" @default.
• W2016790731 modified "2023-09-26" @default.
• W2016790731 title "Characterization of ferromagnetic Co-implanted rutile TiO/sub 2/(110)" @default.
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• W2016790731 doi "https://doi.org/10.1109/nano.2003.1231702" @default.
• W2016790731 hasPublicationYear "2004" @default.
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