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• W2016808412 abstract "This paper proposes a new paradigm for coordination of lithography and design at advanced technology nodes. Growing complexity of technology without any lithography pitch reduction (knowing that we don't have any imminent lens NA or wavelength improvement) we need to challenge node to node scaling more than any time before. To achieve an appropriate scale factor for 20nm and beyond it is necessary to introduce double patterning. We are going to explain how we change our landscape." @default.
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• W2016808412 date "2012-09-01" @default.
• W2016808412 modified "2023-09-27" @default.
• W2016808412 title "Lithography and design integration &#x2014; New paradigm for the technology architecture development" @default.
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• W2016808412 doi "https://doi.org/10.1109/cicc.2012.6330685" @default.
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