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- W2016829787 abstract "Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications." @default.
- W2016829787 created "2016-06-24" @default.
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- W2016829787 date "2010-04-06" @default.
- W2016829787 modified "2023-10-09" @default.
- W2016829787 title "Nanolithography of Single-Layer Graphene Oxide Films by Atomic Force Microscopy" @default.
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- W2016829787 doi "https://doi.org/10.1021/la101077t" @default.
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