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- W2016861938 abstract "Auger recombination is often thought to be the dominant recombination mechanism in highly doped silicon. Auger coefficients in the neighborhood of 3×10 -31 cm 6 /sec for n-type silicon are required to explain experimental lifetime data. A new method of studying Auger recombination through the hot electrons generated is presented and discussed. This technique uses the large difference in tunneling probability through a thin SiO 2 layer between thermal and hot electrons to actually detect the hot Auger electrons. These measurements establish an upper limit on the band-to-band Auger coefficient of 5×10 -32 cm -6 /sec. This result will be shown to be consistant with lifetime studies in laser generated electron-hole plasmas. The implication of this work is that recombination in highly doped silicon is usually dominated by trap assisted, and hence technologically variable, processes. Several possible candidates for this additional recombination are presented and briefly discussed." @default.
- W2016861938 created "2016-06-24" @default.
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- W2016861938 date "1983-01-01" @default.
- W2016861938 modified "2023-09-25" @default.
- W2016861938 title "(Invited) Auger Recombination Study in Silicon Using a Tunneling Technique" @default.
- W2016861938 doi "https://doi.org/10.7567/jjaps.22s1.547" @default.
- W2016861938 hasPublicationYear "1983" @default.
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