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- W2016945297 abstract "As result of its high resistivity and good magnetic properties, electrodeposited amorphous Co–P (a-Co–P) is an attractive material for use in the integration of on-chip inductors into silicon process technology. However as an amorphous material, the properties of a-Co–P are dramatically changed upon crystallization. This paper reports a novel electrodeposited magnetic alloy, a-Co–P–Re that shows a significantly improved thermal performance in comparison to a-Co–P, retaining coercivity, Hc<92 A/m after a thermal anneal at 298 °C. These results were obtained for alloys with a composition of; Co 100−x−y, Px, Rey where; 9.7 at%<x<17.5 at% and 0.4 at%<y<7.6 at%. Other important properties namely, saturation magnetisation, Ms, and resistivity, ρ, appear to be largely unaffected by the addition of Re." @default.
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- W2016945297 date "2010-05-01" @default.
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- W2016945297 title "Electrodeposited amorphous Co–P based alloy with improved thermal stability" @default.
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- W2016945297 doi "https://doi.org/10.1016/j.jmmm.2009.07.059" @default.
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