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- W2017038931 abstract "Germane (GeH4) has, for the first time, been used as a reducing agent for tungsten hexafluoride in selectively depositing tungsten on silicon. As shown by x-ray diffraction, films deposited below 400 °C consist of the β-W phase with A15 cubic crystal structure. This A15 structure proved to be stabilized by germanium which is probably incorporated in the film as a hitherto unknown W3Ge compound. Annealing for 1 h at 575 °C did not change the β-W structure to the low-resistivity body-centered-cubic α phase of tungsten. The superconducting transition temperature of the films is ≊3 K. The growth rate dependence on temperature, total pressure, and WF6, GeH4, and H2 partial pressure has been investigated. At deposition temperatures above 400 °C the deposited films consist of a mixture of the β and α-W phase." @default.
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- W2017038931 date "1990-07-23" @default.
- W2017038931 modified "2023-10-14" @default.
- W2017038931 title "Selective chemical vapor deposition of tungsten using WF6 and GeH4" @default.
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- W2017038931 doi "https://doi.org/10.1063/1.103690" @default.
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