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- W2017056285 abstract "Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation M. A. Blauw, E. van der Drift, G. Marcos, A. Rhallabi; Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation. Journal of Applied Physics 15 November 2003; 94 (10): 6311–6318. https://doi.org/10.1063/1.1621713 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioJournal of Applied Physics Search Advanced Search |Citation Search" @default.
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- W2017056285 title "Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation" @default.
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