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- W2017093721 abstract "X-ray reflectivity has been used to characterize the interfacial structure of as-grown SiO2 layers deposited on Si(111) substrates by rf magnetron sputtering under different substrate temperatures. Results indicate that there exists a higher-density interfacial layer between crystalline Si and the amorphous SiO2 overlayer. As the substrate temperature was increased from 200 to 620 °C, the density of the interfacial layer increased from 2.37 to 2.67 g/cm3, and the thickness of the interfacial layer also increased slightly." @default.
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- W2017093721 title "Temperature dependence of SiO2/Si interfacial structure formed by radio-frequency magnetron sputter deposited SiO2 thin films on Si(111)" @default.
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