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- W2017135612 abstract "In this work, we investigate the influence of the Nb film surface roughness on the microstructure of Nb/AlOx–Al/Nb trilayers and the current–voltage (I–V) characteristics of the trilayer junctions. The surface morphology of the base-Nb film was found to directly affect the Al layer coverage of the base-Nb and the quality of the Al/Nb interface. Diffusion of Al at the Al/Nb interface increases with increasing roughness of the base-Nb layer, which results in micro-shorts or pinholes in the insulating barrier layer and increases the sub-gap leakage current of the junctions. We correlate the I–V characteristics of the junctions to their microstructures and show that Nb surface roughness and Nb/Al interface quality play critical roles in determining the sub-gap leakage characteristics of the trilayer junctions. High-quality Nb/Al–AlOx/Nb trilayer junctions with very low sub-gap leakage currents were obtained after optimizing the Nb film surface morphology." @default.
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- W2017135612 date "2007-10-18" @default.
- W2017135612 modified "2023-10-08" @default.
- W2017135612 title "Influence of Nb film surface morphology on the sub-gap leakage characteristics of Nb<i>/</i>AlO<sub><i>x</i></sub>–Al/Nb Josephson junctions" @default.
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- W2017135612 doi "https://doi.org/10.1088/0953-2048/20/11/s10" @default.
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