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• W2017443759 abstract "Abstract Highly oriented CrO 2 thin films have been heteroepitaxially grown on TiO 2 rutile (110), (100) and (001) single crystalline substrates, by Low Pressure Chemical Vapor Deposition from CrO 3 as precursor and flowing oxygen as carrier gas, under a pressure of 67 Pa. The experimental conditions were fine tuned by depositing on polycrystalline Ti foils, to improve the purity of the films and the deposition rate. A maximum deposition rate of 175 nm h − 1 was obtained. The composition and texture of films, up to 2 μm thick, have been determined by X-ray diffraction (XRD) and Micro Raman, while their microstructure has been examined by Scanning Electron Microcopy and Atomic Force Microscopy, and their magnetic behavior has been tested by superconducting quantum interference device magnetometry. These techniques reveal that the phase purity, texture, microstructure and thickness of these films are dependent on the crystalline face of the rutile substrate and the deposition temperature. Thus, microscopy techniques, XRD and Raman spectroscopy confirm that highly textured CrO 2 films were always obtained on the three rutile substrate faces when deposition temperature ranges between 616 K and 636 K. But these techniques also show that CrO 2 films are unpurified with inclusions or patches of Cr 2 O 3 , for the most of the substrates and especially at high deposition temperatures. Magnetic measurements conclusively demonstrate that pure CrO 2 films are only obtained when TiO 2 (110) is used as a substrate." @default.
• W2017443759 created "2016-06-24" @default.
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• W2017443759 date "2013-07-01" @default.
• W2017443759 modified "2023-10-18" @default.
• W2017443759 title "Preparation and characterization of CrO2 films by Low Pressure Chemical Vapor Deposition from CrO3" @default.
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• W2017443759 doi "https://doi.org/10.1016/j.tsf.2013.04.118" @default.
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