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- W2017451375 abstract "Abstract In this paper we present the design, fabrication and characterisation of passive inductors on a silicon substrate. These inductors were fabricated using a 10 μm minimum-feature CMOS process, with two aluminium layers and SiO 2 as the inter-level dielectric. Polygonal and circular inductors of four-and-a-half and seven-and-a-half turns were designed, fabricated and measured using a vector network analyser in the 40 MHz to 5 GHz range. Experimental results were compared to the predicted response of a simple equivalent electrical model. Compared to other reported inductors on silicon, the ones presented here show very good characteristics." @default.
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- W2017451375 date "2003-02-01" @default.
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- W2017451375 title "Fabrication, characterisation and modelling of integrated on-silicon inductors" @default.
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- W2017451375 doi "https://doi.org/10.1016/s0026-2714(02)00289-5" @default.
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