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- W2017702907 abstract "Nickel contacts on n-Si were bombarded with 100 keV Si+ ions, with doses ranging from 1 × 1015 to 1 × 1016 Si+cm2. The I−V characteristics of these contacts were determined before and after implantation. These data were fitted to a non-ideal diode equation. Parameters obtained in this way include the saturation current Is, the ideality constant n, the series resistance R and the Schottky barrier height φB. These quantities form the basis for comparing the electrical characteristics of the above-mentioned contacts. Compositional depth profiles were obtained using Rutherford backscattering and Auger electron spectroscopy. Radiation damage due to the bombarding ions were investigated by means of α-particle channeling." @default.
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- W2017702907 title "Ion bombardment of nickel contacts on silicon" @default.
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- W2017702907 doi "https://doi.org/10.1016/0168-583x(88)90311-4" @default.
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