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- W2017744369 abstract "Using an electric discharge as the excitation source we have overcome the problem of Xe+2 absorption and have observed lasing at 282 nm in XeBr at the 60-mJ/pulse level. HBr is used as the halogen donor. Simultaneous laser oscillation at 291 nm in Br2 has also been observed. The present laser, however, has materials compatibility problems causing short static-fill lifetimes." @default.
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- W2017744369 date "1978-04-15" @default.
- W2017744369 modified "2023-09-27" @default.
- W2017744369 title "High‐energy lasing of XeBr in an electric discharge" @default.
- W2017744369 cites W1966071490 @default.
- W2017744369 doi "https://doi.org/10.1063/1.90092" @default.
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