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- W2017751919 abstract "Abstract The properties of a nanocomposite resist formed by the addition of ruthenium metal clusters, [Ru11H(CO)27]3−, to PMMA has been investigated. Depending on the amount added, the nanocomposite resist displayed a reduction in rate of dry etching of between 20% and 55%. The sensitivity of the resist was found to be 7 C/m2. Contrast was not affected. Gratings of 80 nm pitch have been fabricated." @default.
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- W2017751919 date "1998-03-01" @default.
- W2017751919 modified "2023-09-27" @default.
- W2017751919 title "Electron-beam exposure characteristics of a novel Ru-PMMA composite resist" @default.
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- W2017751919 doi "https://doi.org/10.1016/s0167-9317(98)00075-6" @default.
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