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- W2017838434 abstract "Pulsed DC reactive sputtering is a very interesting technique for coating applications. Reactive sputtering can give very dense layers, low stress of the deposited multilayer film, high reproducibility, very high hardness (up to 1200 Vickers hardness) with unbeatable high rates ideal for industrial applications. SP-100 is Satisloh reactive sputtering systems with only one target material but can deposit various film materials simply by using different gases such as argon, as well as the reactive gases nitrogen and oxygen. Silicon-oxides, silicon-nitrides and all kinds of silicon-oxy-nitrides (SiO<sub>x</sub>-Si<sub>x</sub>O<sub>y</sub>N<sub>z</sub>-Si<sub>x</sub>N<sub>y</sub>) with a refractive index range of 1.44-2.05 in the visible range can be obtained. In the reactive sputtering the material it is usually deposited in the so called “transition mode” where it must be found the correct equilibrium point between the target voltage and the reactive gas flow. The transition mode assures a dense film with a stable rate. Condition to find such equilibrium point is given by the so called “material hysteresis” in which the target voltage is depicted in function of the reactive gas voltage. The hysteresis and the consequent equilibrium point are strongly depended by the power supplied to the target and the inert gas (argon) flow which could affect the optical characteristics and the deposition rate. We checked the refractive indexes of the SiO<sub>x</sub> and Si<sub>x</sub>N<sub>y</sub> of very thin (1 QW Optical thickness at 520 nm) and thicker (3, 5 and 9 QW @520 nm) reporting how the different conditions can affect the refractive index and the deposition rate of the different materials." @default.
- W2017838434 created "2016-06-24" @default.
- W2017838434 creator A5019552776 @default.
- W2017838434 creator A5034695621 @default.
- W2017838434 creator A5049599732 @default.
- W2017838434 creator A5050577598 @default.
- W2017838434 creator A5055731156 @default.
- W2017838434 creator A5060486086 @default.
- W2017838434 date "2013-09-06" @default.
- W2017838434 modified "2023-10-14" @default.
- W2017838434 title "Refractive index of thin films realized by Satisloh SP reactive sputtering system" @default.
- W2017838434 doi "https://doi.org/10.1117/12.2030474" @default.
- W2017838434 hasPublicationYear "2013" @default.
- W2017838434 type Work @default.
- W2017838434 sameAs 2017838434 @default.
- W2017838434 citedByCount "0" @default.
- W2017838434 crossrefType "proceedings-article" @default.
- W2017838434 hasAuthorship W2017838434A5019552776 @default.
- W2017838434 hasAuthorship W2017838434A5034695621 @default.
- W2017838434 hasAuthorship W2017838434A5049599732 @default.
- W2017838434 hasAuthorship W2017838434A5050577598 @default.
- W2017838434 hasAuthorship W2017838434A5055731156 @default.
- W2017838434 hasAuthorship W2017838434A5060486086 @default.
- W2017838434 hasConcept C113196181 @default.
- W2017838434 hasConcept C121332964 @default.
- W2017838434 hasConcept C123299182 @default.
- W2017838434 hasConcept C159985019 @default.
- W2017838434 hasConcept C171250308 @default.
- W2017838434 hasConcept C184779094 @default.
- W2017838434 hasConcept C185592680 @default.
- W2017838434 hasConcept C19067145 @default.
- W2017838434 hasConcept C192562407 @default.
- W2017838434 hasConcept C194760766 @default.
- W2017838434 hasConcept C22423302 @default.
- W2017838434 hasConcept C26873012 @default.
- W2017838434 hasConcept C2777431650 @default.
- W2017838434 hasConcept C2779227376 @default.
- W2017838434 hasConcept C42067758 @default.
- W2017838434 hasConcept C43617362 @default.
- W2017838434 hasConcept C49040817 @default.
- W2017838434 hasConcept C544956773 @default.
- W2017838434 hasConcept C547737533 @default.
- W2017838434 hasConcept C61427134 @default.
- W2017838434 hasConceptScore W2017838434C113196181 @default.
- W2017838434 hasConceptScore W2017838434C121332964 @default.
- W2017838434 hasConceptScore W2017838434C123299182 @default.
- W2017838434 hasConceptScore W2017838434C159985019 @default.
- W2017838434 hasConceptScore W2017838434C171250308 @default.
- W2017838434 hasConceptScore W2017838434C184779094 @default.
- W2017838434 hasConceptScore W2017838434C185592680 @default.
- W2017838434 hasConceptScore W2017838434C19067145 @default.
- W2017838434 hasConceptScore W2017838434C192562407 @default.
- W2017838434 hasConceptScore W2017838434C194760766 @default.
- W2017838434 hasConceptScore W2017838434C22423302 @default.
- W2017838434 hasConceptScore W2017838434C26873012 @default.
- W2017838434 hasConceptScore W2017838434C2777431650 @default.
- W2017838434 hasConceptScore W2017838434C2779227376 @default.
- W2017838434 hasConceptScore W2017838434C42067758 @default.
- W2017838434 hasConceptScore W2017838434C43617362 @default.
- W2017838434 hasConceptScore W2017838434C49040817 @default.
- W2017838434 hasConceptScore W2017838434C544956773 @default.
- W2017838434 hasConceptScore W2017838434C547737533 @default.
- W2017838434 hasConceptScore W2017838434C61427134 @default.
- W2017838434 hasLocation W20178384341 @default.
- W2017838434 hasOpenAccess W2017838434 @default.
- W2017838434 hasPrimaryLocation W20178384341 @default.
- W2017838434 hasRelatedWork W1968373997 @default.
- W2017838434 hasRelatedWork W1983916480 @default.
- W2017838434 hasRelatedWork W1986547641 @default.
- W2017838434 hasRelatedWork W1987015944 @default.
- W2017838434 hasRelatedWork W2023239643 @default.
- W2017838434 hasRelatedWork W2056000081 @default.
- W2017838434 hasRelatedWork W2084327918 @default.
- W2017838434 hasRelatedWork W2086744665 @default.
- W2017838434 hasRelatedWork W2790340187 @default.
- W2017838434 hasRelatedWork W4294316265 @default.
- W2017838434 isParatext "false" @default.
- W2017838434 isRetracted "false" @default.
- W2017838434 magId "2017838434" @default.
- W2017838434 workType "article" @default.