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• W2017882266 abstract "Ti-and TiAl-doped a-C:H films were deposited on silicon substrates by magnetron sputtering Ti and TiAl target in argon and methane gas mixture atmosphere. To better elucidate the structural evolution after Al adding, X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy were used to comparatively analyze the structural transformation in the as-deposited films. Compared with Ti-doped a-C:H films, the introduction of Al enhanced carbon films graphitization effectively lowered the residual stress from 1.35 GPa to 0.65 GPa. Furthermore, though the hardness of TiAl-doped a-C:H films was moderately lowered, TiAl-doped a-C:H films exhibited higher toughness, lower friction coefficient and lower wear rate. The better tribological performances of TiAl-doped a-C:H films may originate from the formation of graphitized transfer layer during the friction test." @default.
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• W2017882266 date "2011-05-01" @default.
• W2017882266 modified "2023-10-16" @default.
• W2017882266 title "Effects of Al incorporation on the mechanical and tribological properties of Ti-doped a-C:H films deposited by magnetron sputtering" @default.
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• W2017882266 doi "https://doi.org/10.1016/j.cap.2010.11.060" @default.
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