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- W2018073478 abstract "Abstract We propose a new method to fabricate a superlattice structure of silicon and refractory metal silicide by a plasma controlled magnetron sputtering source. This sputtering source has two magnetic coils: one is a conventional magnetron coil behind the target ( B m ) and the other is a compressing coil ( B c ) to increase the magnetic field parallel to the target surface. These magnetic fields can control the spatial position of intense plasma on the target surface. If they are pulse controlled, it is possible to deposit multilayer films of various compositions and superlattice structures of different materials. The thickness of one layer of our superlattice is 35–70 A. In order to get a sharp profile between layers, the precleaning of the target surface is important. The halfwidths of X-ray diffracted patterns of our samples are between 0.038° and 0.068°. The substrate temperature affects the halfwidth and a good sample is obtained at low temperature of liquid nitrogen." @default.
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- W2018073478 date "1988-09-01" @default.
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- W2018073478 title "Fabrication of superlattice structures by plasma controlled magnetron sputtering" @default.
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