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- W2018082407 abstract "A new material, oxygenated amorphous cadmium telluride, is introduced into the II-VI semiconductor compounds family. Amorphous films of this material have been grown by a radio frequency sputtering deposition technique, using a controlled plasma (Ar-O-N) on glass slides substrates positively dc biased. We show that the bandgap of the films can be changed in a controlled way in the range from 1.48 to 2.02 eV depending on the amount of oxygen present in the sample." @default.
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- W2018082407 date "1991-10-01" @default.
- W2018082407 modified "2023-10-18" @default.
- W2018082407 title "Variable Energy Gap in Oxygenated Amorphous Cadmium Telluride" @default.
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- W2018082407 doi "https://doi.org/10.1143/jjap.30.l1715" @default.
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