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• W2018183393 abstract "Triple patterning lithography (TPL) is one of the most promising lithography technology in sub-14nm technology nodes, especially for complicated low metal layer manufacturing. To overcome the intra-cell routability problem and improve the cell regularity, recently middle-of-line (MOL) layers are employed in standard cell design. However, MOL layers may introduce a large amount of cross-row TPL conflicts for row based design. Motivated by this challenge, in this paper we propose the first TPL aware detailed placement toward zero cross-row MOL conflict. In standard cell pre-coloring, boolean based look-up table is proposed to reduce solution space. In detailed placement stage, two powerful techniques, i.e., local reordered single row refinement (LRSR) and min-cost flow based conflict removal, are proposed to provide zero TPL conflict solution. The experimental results demonstrate the effectiveness of our proposed methodologies." @default.
• W2018183393 created "2016-06-24" @default.
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• W2018183393 date "2015-11-02" @default.
• W2018183393 modified "2023-10-16" @default.
• W2018183393 title "Triple Patterning Aware Detailed Placement Toward Zero Cross-Row Middle-of-Line Conflict" @default.
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• W2018183393 doi "https://doi.org/10.5555/2840819.2840875" @default.
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