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- W2018224863 abstract "It was demonstrated that it is possible to prevent the crystallization of buried Si3N4 layers formed by N+ implantation with E = 150 keV, Φ = 5.0 × 1017N+cm2and TA = 1200°C (2 h). To achieve this, preliminary implantation with E = 150 keV and Φ ⩾ 5.0 × 1016O+cm2 has to be carried out. Radiation defects induced during O+ implantation stimulate the process of crystallization." @default.
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- W2018224863 date "1992-01-01" @default.
- W2018224863 modified "2023-09-27" @default.
- W2018224863 title "Ion beam synthesis of Si3N4 amorphous buried layers" @default.
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- W2018224863 doi "https://doi.org/10.1016/0921-5107(92)90259-c" @default.
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