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- W2018274164 abstract "Abstract The deposition of Ag C:H films from a combined physical vapour deposition (PVD; sputtering of silver) and rf-plasma-supported chemical vapour deposition (CVD; deposition of CnHm radicals) process (PCVD) is described. The amount of carbon and metal in Me C:H films can be adjusted by varying the argon to hydrocarbon ratio fed into the plasma. In contrast, for the PCVD deposition of Ag C:H films, a threshold behaviour of the C deposition into the films as a function of the hydrocarbon concentration in the plasma gas is observed. This phenomena was utilized to get a further insight into the PCVD process. To analyse the deposited films and the silver-sputter-target, X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) were used. In addition, Monte Carlo computer simulations of the particle transport from the sputter target to the substrate were performed." @default.
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- W2018274164 modified "2023-10-16" @default.
- W2018274164 title "Characterisation of the AgC:H deposition process" @default.
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- W2018274164 doi "https://doi.org/10.1016/0925-9635(92)90045-p" @default.
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