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- W2018399350 abstract "Optical scatterometry and Optical Digital Profiling (ODP) have become mainstram technology in CD and profile metrology. Without question, the extension of these techniques to measure 3D patterns such as contact holes or posts is an important demand. In this paper, we demonstrate the application of ODP to contact holes and posts for both lithography and etch processes. The underlying theory based onthe Rigorous Coupled Wave Approach is outlined and metrology results are compared with simulations." @default.
- W2018399350 created "2016-06-24" @default.
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- W2018399350 date "2003-05-27" @default.
- W2018399350 modified "2023-09-23" @default.
- W2018399350 title "Optical digital profilometry applications on contact holes" @default.
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- W2018399350 doi "https://doi.org/10.1117/12.483686" @default.
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