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- W2018508111 abstract "The electron optical conditions for the high resolution structure image of silicon oriented in (110) are researched on the basis of the calculation of image contrasts using the multislice theory. Effects of various parameters such as crystal thickness, the amount of defocus, the size of objective aperture, chromatic aberration and misorientation of the crystal on the images are clarified. It is found that the optimum thickness giving the highest contrast image is about 130 Å and the optimum defocus appears periodically at this thickness with a width of ∼10 Å and with a period of ∼1600 Å for the spherical aberration coefficient, C s =0.7 mm. The allowable fluctuation of defocus due to chromatic aberration is found to be ∼40 Å, and the allowable misorientation angle of a crystal is ∼2×10 -3 rad." @default.
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- W2018508111 date "1980-05-01" @default.
- W2018508111 modified "2023-09-27" @default.
- W2018508111 title "Electron Optical Conditions for the Formation of Structure Images of Silicon Oriented in (110)" @default.
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- W2018508111 doi "https://doi.org/10.1143/jjap.19.799" @default.
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