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• W2018532394 abstract "Sr Ti O 3 thin films have been deposited on Si (001) wafers by laser molecular beam epitaxy using an ultrathin Sr layer as the template. X-ray diffraction measurements indicated that SrTiO3 was well crystallized and epitaxially aligned with Si. Cross-sectional observations in a transmission electron microscope revealed that the SrTiO3∕Si interface was sharp, smooth, and fully crystallized. The thickness of the Sr template was found to be a critical factor that influenced the quality of SrTiO3 and the interfacial structure. Electrical measurements revealed that the SrTiO3 film was highly resistive." @default.
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• W2018532394 date "2007-01-01" @default.
• W2018532394 modified "2023-10-09" @default.
• W2018532394 title "Epitaxial growth of SrTiO3 thin film on Si by laser molecular beam epitaxy" @default.
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• W2018532394 doi "https://doi.org/10.1063/1.2430407" @default.
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