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- W2018563445 abstract "Model of random telegraph noise (RTN) in gate-induced drain leakage (GIDL) current was proposed and explained together with that of gate edge tunneling (ET) current. A trap inside the gate dielectric between the drain and the gate of a metal-oxide-semiconductor field-effect transistor can affect theoretically both GIDL and gate ET currents at the same time. However, the RTNs for both currents were mostly uncorrelated and its cause was clarified. The RTN in GIDL current has a strong relation with a localized defect region in the drain overlapped by the gate. In the RTN of GIDL current, the shallower trap depth can show the larger amplitude of a RTN but sometimes show unexpectedly small amplitude if a trap is misaligned with the defect region." @default.
- W2018563445 created "2016-06-24" @default.
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- W2018563445 date "2012-01-16" @default.
- W2018563445 modified "2023-10-10" @default.
- W2018563445 title "Model of random telegraph noise in gate-induced drain leakage current of high-k gate dielectric metal-oxide-semiconductor field-effect transistors" @default.
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- W2018563445 doi "https://doi.org/10.1063/1.3678023" @default.
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