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- W2018587829 abstract "Abstract The small signal admittance characteristics of a narrow diffused p-n junction diode with gaussian and complementary error function impurity profile are obtained through ‘piecewise exponential approximation’ of the non-homogeneously doped region, which effectively takes into account the built-in field and mobility variations. The results show that a single exponential model usually assumed for the evaluation of diffused devices results in an overestimate of the admittance parameters specially when there is considerable grading of impurities. When the diffused region is narrow the surface recombination velocity characterizing the non-ideality of the contact has significant influence on the admittance parameters. It is seen that the contributions to the admittance from the diffused and homogeneous regions are comparable in magnitude." @default.
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- W2018587829 date "1971-11-01" @default.
- W2018587829 modified "2023-10-04" @default.
- W2018587829 title "Admittance characteristics of a p-n junction diode with narrow diffused region" @default.
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- W2018587829 doi "https://doi.org/10.1016/0038-1101(71)90023-2" @default.
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