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- W2018697060 abstract "A model for the inversion charge centroid of surrounding gate transistors (SGTs) has been obtained in order to consider HfO <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> as gate insulator instead of SiO <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> . The results obtained with the model have been compared to the simulation data provided by a self-consistent solution of the 2D Poisson and Schrodinger equations. Our model reproduces correctly the inversion charge centroid data of several SGTs with different values of the silicon radii (4, 6.25 and 8 nm) and values of the HfO <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> effective mass in the range of m*/m0 [0.1-0.7]. The inversion charge including quantum effects has also been calculated for SGTs with HfO <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</inf> as gate insulator." @default.
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- W2018697060 date "2009-02-01" @default.
- W2018697060 modified "2023-09-27" @default.
- W2018697060 title "A new inversion charge centroid model for surrounding gate transistors with HfO<inf>2</inf> as gate insulator" @default.
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- W2018697060 doi "https://doi.org/10.1109/sced.2009.4800441" @default.
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