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• W2018772456 startingPage "56" @default.
• W2018772456 abstract "Aluminum films are deposited in oxygen background at an ambient pressure of 100 mTorr by pulsed laser deposition technique at various target–substrate distances. Two-dimensional images of the laser-ablated aluminum plumes were recorded using Integrated Charged Couple Device (ICCD) camera system. The importance of these images in optimising the target–substrate distance for the deposition of various films is reported. An attempt is made to correlate the characteristics of the film with that of laser-ablated plume parameters. We observed that at a critical target–substrate distance, the films obtained are oxygen-rich." @default.
• W2018772456 created "2016-06-24" @default.
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• W2018772456 date "1999-04-01" @default.
• W2018772456 modified "2023-09-23" @default.
• W2018772456 title "Laser-ablated plasma for deposition of aluminum oxide films" @default.
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• W2018772456 doi "https://doi.org/10.1016/s0169-4332(98)00930-1" @default.
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