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- W2018778208 abstract "Fe films were deposited by ion beam sputtering using Ar and Kr gases. The sputtering voltage Vs was varied in the range of 900-1800 V. The magnetic properties of the films had a significant relationship with the element used as the sputtering gas. The saturation magnetization 4πMs was 21 kG for At and 20 kG for Kr. The coercivity Hc took a minimum value of 5 Oe at Vs of 1200 V for Ar.The energy and the number of energetic particles, such as the sputtered atoms and the recoiled ions bombarding the substrate was calculated by Monte-Carlo simulation in the sputtering system with an amorphous Fe target. The average energy of the sputtered atoms EFe was 36-62 eV for Ar and 30-36 eV for Kr. The average energy of the recoiled ions ER was 200-370 eV for Ar and 60-100 eV for Kr. The difference in energy between these two sputtering gases, which have the different atomic masses, was remarkable. Bombardment with the sputtered atoms and recoiled ions at high energy reduced Hc of the Fe films. The atomic mass of the sputtering gas was an important parameter in determining the properties of films deposited by ion beam sputtering." @default.
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- W2018778208 date "2000-01-01" @default.
- W2018778208 modified "2023-09-26" @default.
- W2018778208 title "Magnetic Properties of Fe Films Deposited by Ion Beam Sputtering Using Ar and Kr Gas." @default.
- W2018778208 doi "https://doi.org/10.3379/jmsjmag.24.527" @default.
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