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- W2018793059 abstract "Experimental and analytical model evaluation of process control.Michael P. C. WattsM. Richard HannifanAZ Photoresist Products, 615 Palomar AvenueSunnyvale, California 94086AbstractA new analytical model of the exposure and development of optical positive resists isused to quantitatively evaluate process control. Using this model, a new method is de-scribed that allows for the rapid extraction of the characteristics parameters that de-scribe the exposure and development of resists. Characteristic parameters were measured forAZ 1300SF in two concentrations of AZ 351 and AZ developers, respectively. Line width vari-ations that would result from specific process variations were calculated for the differentdevelopers. It is clearly shown that dilute developers operating at optimal exposure dosesgive the best control.IntroductionLine width control is one of the most important performance parameters associated withany lithography process. In this paper a new analytical model of optical positive resistexposure and development will be used to evaluate process control. The analytical model isdescribed in detail in the accompanying paper'.Specifically, the analytical model will be used for the rapid extraction of the charac-teristic exposure and solubility parameters for many resist -developer systems. The parametersare used to provide a quantitative prediction of the compromise between photospeed and pro-cess control for a broad range of process conditions. The modeling results are compared toan experimental evaluation of process control to demonstrate the accuracy of the model.Overview of the analytical modelThe analytical model consists of three sections:Exposure modelThe exposure model allows the calculation of the exposed sensitizer concentration in theresist for any given exposure dose, film type, etc. It includes approximations for five keyphenomena:" @default.
- W2018793059 created "2016-06-24" @default.
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- W2018793059 date "1985-04-18" @default.
- W2018793059 modified "2023-09-26" @default.
- W2018793059 title "Optical Positive Resist Processing. II. Experimental And Analytical Model Evaluation Of Process Control." @default.
- W2018793059 doi "https://doi.org/10.1117/12.947810" @default.
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