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• W2018797007 abstract "Abstract The two-dimensional thermal oxidation of silicon at moderate furnace temperatures has been modelled using a boundary element based algorithm, and an efficient computer code has been developed that provides a good representation of this complex moving boundary problem. The model is applied here to the optimisation of the sidewall masked isolation process, a technique that reduces the intrusion of the oxide beneath the nitride masking film and improves the packing density of the integrated circuits on the silicon wafer." @default.
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• W2018797007 date "1991-11-01" @default.
• W2018797007 modified "2023-09-26" @default.
• W2018797007 title "Modelling the sidewall masked oxidation process using the boundary element method" @default.
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• W2018797007 doi "https://doi.org/10.1016/0026-2692(91)90012-c" @default.
• W2018797007 hasPublicationYear "1991" @default.
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