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- W2019164893 abstract "In this paper, thin HfO2 films were grown by using E-beam evaporation technique in vacuum and O2 ambient, respectively. Effects of O2 ambient on structural, optical and electrical properties of the HfO2 films were investigated by deploying x-ray photoelectron spectroscopy, ultraviolet visible spectroscopy, I-V and C-V characteristics. Results show that the O2 ambient deposited HfO2 films exhibited excellent structural, optical and electrical properties as compared with vacuum ambient HfO2 films, which especially performs a low content of metal Hf, a high transmittance, a low leakage current and a high dielectric constant." @default.
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- W2019164893 date "2010-11-01" @default.
- W2019164893 modified "2023-09-26" @default.
- W2019164893 title "Effects of O<sub>2</sub> Ambient on Structural, Optical and Electrical Properties of Hafnium Oxide Thin Films Prepared by E-Beam Evaporation" @default.
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- W2019164893 doi "https://doi.org/10.4028/www.scientific.net/msf.663-665.413" @default.
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