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- W2019179123 abstract "Chrome-on-quartz optics serve multi-functions including high-resolution masks for UV lithography. At the next node down, F<sub>2</sub>-laser lithography demands alternate high-transparency substrates such as wide-bandgap CaF<sub>2</sub>. We present here a direct-write method of F<sub>2</sub>-laser ablation for selective removal of 110-nm thick chrome films on CaF<sub>2</sub> and SiO<sub>2</sub> (fused silica) substrates. Laser-processing parameters are presented for micropatterning of the chrome film with minimal damage to the underlying substrates. Damage thresholds, ablations rates, incubation processes, and surface morphology of the chrome and CaF<sub>2</sub> are described together with methods that reduce ablation debris and collateral damage. Laser-patterned masks are tested in a 157-nm optical projection system at 30-mJ/cm<sup>2</sup> fluence for sub-micron laser structuring of glass and other materials." @default.
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- W2019179123 date "2003-07-18" @default.
- W2019179123 modified "2023-09-25" @default.
- W2019179123 title "F 2 -laser micropatterning of chrome-coated CaF 2 for vacuum-ultraviolet masks" @default.
- W2019179123 doi "https://doi.org/10.1117/12.479538" @default.
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