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- W2019218474 abstract "1.7-µm-thick SAL601 single-layer resist was post-exposed to monochromatic deep UV flood light after e-beam delineation to enhance its resolution. Substantially improved pattern shape and pattern size controllability were obtained by exposing the resist to 254- and 248-nm light where SAL601 has absorption coefficients of 0.46 and 0.88 µm -1 , respectively. Monte Carlo simulation of the deposition energy profile indicates that the incident light reaches considerable depth in the resist and modifies the whole preexisting latent image formed by e-beam delineation." @default.
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- W2019218474 date "1991-12-01" @default.
- W2019218474 modified "2023-09-25" @default.
- W2019218474 title "Modification of E-Beam Latent Images in Negative Resist by Exposure to Monochromatic Deep UV Flood Light" @default.
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