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- W2019275088 abstract "This polycrystalline silicon films with a crystalline grain size of 50–100 μm were grown by quasi-rheotaxy on glass substrates covered by a thin previously grown aluminium layer. The aluminium and silicon were both deposited by high vacuum electron beam evaporation. The thin silicon films exhibit only the (111) orientation for thicknesses of less than 1 μm, whereas for thicker films the (220) orientation begins to appear. The latter orientation prevails for films thicker than 10 μm. Crystalline grains as large as 10–20 μm were obtained." @default.
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- W2019275088 date "1987-03-01" @default.
- W2019275088 modified "2023-09-23" @default.
- W2019275088 title "Thin polycrystalline silicon films grown by quasi- rheotaxy on aluminium-covered glass substrates" @default.
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- W2019275088 doi "https://doi.org/10.1016/0040-6090(87)90020-4" @default.
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