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• W2019394610 abstract "Nanoscale features as small as 65 +/- 5 nm have been formed reproducibly by using 520 nm femtosecond pulsed excitation of a 4,4'-bis(di-n-butylamino)biphenyl chromophore to initiate crosslinking in a triacrylate blend. Dosimetry studies of the photoinduced polymerization were performed on chromophores with sizable two-photon absorption cross-sections at 520 and 730 nm. These studies show that sub-diffraction limited line widths are obtained in both cases with the lines written at 520 nm being smaller. Three-dimensional multiphoton lithography at 520 nm has been used to fabricate polymeric woodpile photonic crystal structures that show stop bands in the near-infrared spectral region." @default.
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• W2019394610 date "2007-01-01" @default.
• W2019394610 modified "2023-09-25" @default.
• W2019394610 title "65 nm feature sizes using visible wavelength 3-D multiphoton lithography" @default.
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• W2019394610 doi "https://doi.org/10.1364/oe.15.003426" @default.
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