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- W2019428785 abstract "Molecular dynamics simulations have been carried out to model the implantation of boron into silicon at low energies using boron difluoride. It is shown that at a molecular impact energy of 460 eV the implantation profiles have an orientation dependence with penetration of the boron furthest when the F atoms are aligned perpendicular to the surface. The simulations also predict maximum damage in the surface layer where a peak in the fluorine atoms also occurs. The boron distribution is flatter with a peak which is deeper at 10–15 Å." @default.
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- W2019428785 date "1999-04-01" @default.
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- W2019428785 title "Implantation of silicon using the boron cluster BF2" @default.
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