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- W2019447208 abstract "The paper presents the fabrication of Si 3 N 4 nanowires prepared on Si substrate by plasma-enhanced chemical vapor deposition (PECVD) technology. The nanowires were formed using silane (SiH 4 ) and nitrogen (N 2 ) as reactive gases under the action of Fe catalysts. They are characteristics of superlong straight and flexural types observed by field emission scanning electron microscopy (FESEM). The former with a length of 3.96 mm has smooth surface and uniform diameter resulting from an orientation growth process, while the latter is 5.20 mm formed by two nanowires twisted together with a squeezing growth way. A growth model has been developed for the formation of the nanowires, and the growth mechanism of the nanowires has been discussed. The straight and flexural Si 3 N 4 nanowires can be used as nano-scaled bridge, spring, and cantilever in the fabrication of nano-machine systems." @default.
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- W2019447208 date "2011-06-01" @default.
- W2019447208 modified "2023-09-27" @default.
- W2019447208 title "Long Si<sub>3</sub>N<sub>4</sub> Nanowires Fabricated by PECVD" @default.
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- W2019447208 doi "https://doi.org/10.4028/www.scientific.net/msf.688.85" @default.
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