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- W2019554927 abstract "Abstract The investigation of MIS structures with thin metal oxide films by the classical C – V methods is impeded because of the specific properties of the dielectric material: high dielectric permittivity, electronic polarization, high dielectric losses, thermodynamic reaction with the silicon surface and formation of multi-phased systems. Complex impedance spectroscopy has been used for investigation of MIS structures with films of (Al 2 O 3 ) x (TiO 2 ) 1− x . The dielectric films were deposited on Si substrates by spin-on-coating from sol solution and underwent additional thermal treatment. Using the spectroscopic plot of the imaginary part of the impedance versus frequency, the different capacitance components of the MIS structure were evaluated. The correct value of the relative dielectric constant e r and interface states can be determined from the capacitance components." @default.
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- W2019554927 date "2004-11-01" @default.
- W2019554927 modified "2023-09-27" @default.
- W2019554927 title "Investigation of thin film of metal oxides on silicon with impedance spectroscopy" @default.
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- W2019554927 doi "https://doi.org/10.1016/j.vacuum.2004.07.015" @default.
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