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- W2019709698 abstract "Formation of nanoparticles in a 50-nm-thick SiO2 film on Si was conducted by silver negative ion implantation at 30 keV with various doses, and the state of nanoparticles in the thin oxide film was observed by a cross-sectional scanning TEM. The sample implanted with 1 × 1015 ions/cm2 showed nanoparticles with diameter of about 2–3 nm distributed in the middle of the SiO2 film on Si. The location of nanoparticles was in good agreement with the calculated profile by TRIM-DYN. Nanoparticles with various diameters of 4–8 nm formed in samples of 1 × 1016 and 1 × 1017 ions/cm2. The size of silver nanoparticles was found to relate strongly to density of implanted atoms in the layer." @default.
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- W2019709698 date "2003-05-01" @default.
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- W2019709698 title "Formation of silver nanoparticles in thin oxide layer on Si by negative-ion implantation" @default.
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