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- W2019767049 abstract "Cu ∕ Ni ∕ Cu films grown epitaxially on Si have shown perpendicular magnetic anisotropy over a wide range of Ni thicknesses. Using interferometric lithography and ion milling, epitaxial and polycrystalline Cu∕Ni∕Cu films were patterned into large area arrays of parallel lines with widths of 100 and 200nm. The effect of patterning on the anisotropy of Cu∕Ni∕Cu with tNi=6.9 and 20.6nm was determined from M-H loops measured by vibrating sample magnetometry. The nanolines show significantly reduced tendency toward perpendicular magnetization and increased energy favoring magnetization across the linewidth. These results are interpreted in terms of magnetoelastic energy changes due to relaxation of misfit strain upon patterning and shape anisotropy." @default.
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- W2019767049 date "2006-04-15" @default.
- W2019767049 modified "2023-10-18" @default.
- W2019767049 title "Effect of nano-patterning on anisotropy of Cu∕Ni∕Cu nanolines" @default.
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- W2019767049 doi "https://doi.org/10.1063/1.2176596" @default.
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