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• W2019804949 abstract "Current methods to produce silk films include casting and spin coating. Here we introduce a new method for the fabrication of silk films: electrogelation. Through use of a closed-loop anode, films with high surface smoothness and optical transparency are produced. Bending the electrode loop allows films with three-dimensional topologies to be formed, possessing thicknesses capable of descending into the submicron thin film regime." @default.
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• W2019804949 date "2014-06-24" @default.
• W2019804949 modified "2023-10-06" @default.
• W2019804949 title "Rapid fabrication of silk films with controlled architectures via electrogelation" @default.
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• W2019804949 doi "https://doi.org/10.1039/c4tb00833b" @default.
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