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- W2019906195 abstract "thin films on (001) with excellent alignment suitable for microwave applications at 77 K have been fabricated using an ex situ anneal step in argon atmospheres at temperatures of . Surface resistance values as low as 400 (79 K, 10 GHz) and large-area critical current densities up to (77 K) have been achieved. In order to understand the relationship between the microstructure and electrical properties the films have been characterized by a variety of techniques, but especially transmission electron microscopy and allied methods. Microstructural features such as a-axis oriented grains, secondary phase particles, grain boundaries and surface outgrowths (especially of non-superconductor phases) have been found to have a significant effect on the surface resistance." @default.
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- W2019906195 date "1998-02-01" @default.
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- W2019906195 title "The microstructure and electrical properties of thin films processed at low temperatures" @default.
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- W2019906195 doi "https://doi.org/10.1088/0953-2048/11/2/007" @default.
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