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- W2019910306 abstract "The specific contact resistivities (ρc) ofAl(1%Si)n+−Si and TiSi2n+−Si contact systems were studied by using a “self-aligned” vertical Kelvin test resistor structure. The SAVTR structure can eliminate the misalignment error of the vertical test structure, thus the results obtained are closer to the true specific contact resistivities than those obtained by any other methods. For the Al(1%Si)n+−Si contact system, a specific contact resistivity of 1 × 10−7 Ω-cm2 has been obtained. For the TiSi2 systems, the TiSi2 (direct-reaction)/n+-Si contact system offers a lower ρc than that of the TiSi2 (coevaporation)/n+−Si system. For both the TiSi2 (direct-reaction and coevaporation) contacts, the ρc does not change even after the system is annealed as high as 900°C." @default.
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- W2019910306 date "1989-11-01" @default.
- W2019910306 modified "2023-10-01" @default.
- W2019910306 title "Contact resistivities of Al and Ti on Si measured by a self-aligned vertical Kelvin test resistor structure" @default.
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- W2019910306 doi "https://doi.org/10.1016/0038-1101(89)90162-7" @default.
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