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- W2019913778 abstract "A process for the patterned self-assembly of nanometer-scale particles within a solid is described. The process uses crystal strain and composition to guide the formation of arsenic precipitates in GaAs-based epitaxial layers grown at low temperature by molecular beam epitaxy. The lateral particle position is controlled by the strain produced by a surface stress structure while the vertical position is controlled by the epitaxial layer composition. Arsenic particles ∼16-nm in diameter are fabricated in one-dimensional arrays with a 23-nm edge-to-edge particle spacing at a depth of 45 nm below stressors 200 nm in width, thereby demonstrating this technique." @default.
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- W2019913778 date "1996-01-22" @default.
- W2019913778 modified "2023-09-24" @default.
- W2019913778 title "Patterned self‐assembly of one‐dimensional arsenic particle arrays in GaAs by controlled precipitation" @default.
- W2019913778 doi "https://doi.org/10.1063/1.116419" @default.
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